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  • 1.
    Carlqvist, Per
    et al.
    Micronic Laser Systems AB, Sweden .
    Brattström, Patrik
    KTH, School of Industrial Engineering and Management (ITM), Machine Design (Dept.), Mechatronics.
    During, Carl
    KTH, School of Industrial Engineering and Management (ITM), Machine Design (Dept.), Mechatronics.
    Optimization of Active Vibration Control of a Laser Pattern Generator in Micro Lithography2010In: Proceedings of the 10th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2010, euspen , 2010, Vol. 1, p. 491-494Conference paper (Refereed)
    Abstract [en]

    The extreme precision requirements in semiconductor manufacturing drive the need for an active vibration isolation system in a laser pattern generator. Optimization has been performed and evaluated in a model using a high level programming tool [1]. The areas of optimization were 1) Decoupling strategies for decentralized control and 2) Improved feed forward control. Only a limited description of the model itself is given here. More about the model is presented in [2] and [3].

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