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Combined Tungsten Disulfide and Graphene Low Friction Thin Film: Synthesis and Characterization
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences.
2015 (English)Independent thesis Advanced level (degree of Master (Two Years)), 20 credits / 30 HE creditsStudent thesis
Abstract [en]

Tungsten disulfide is a proven material as a low friction solid coating. The material is well characterized and has proven its capabilities the last century. Graphene is this centurys most promising material with electrical and mechanical properties. With it the 2D material revolution have started.

In this thesis I present a feasible way to sputter tungsten disulfide on graphene as a substrate with little damage to the graphene from energetic particles and a straight forward method to quantize the damage before and after deposition. Further I investigate compositional changes in the sputtered films depending on processing pressure and how tungsten disulfide film thickness and the amount of graphene damage affects the materials low friction capabilities. It is shown that graphene is not a viable substrate for a low friction tungsten disulfide film and that tungsten disulfide is an excellent material for low friction coatings even down too a few nanometers and that the films behavior during load in the friction testing significantly depends on the processing pressure during sputtering. 

Place, publisher, year, edition, pages
2015. , 50 p.
TVE, 15060 JUNI
Keyword [en]
Graphene, Tungsten disulfide, Low friction, Thin film, Sputtering
National Category
Engineering and Technology
URN: urn:nbn:se:uu:diva-255569OAI: diva2:822798
Available from: 2015-06-18 Created: 2015-06-17 Last updated: 2015-06-18Bibliographically approved

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