X-ray photoelectron spectroscopy analyses of the electronic structure of polycrystalline Ti1-xAlxN thin films with 0 < x < 0.96
2014 (English)In: Surface Science Spectra, ISSN 1055-5269, E-ISSN 1520-8575, Vol. 21, 35-49 p.Article in journal (Refereed) Published
Metastable Ti1-xAlxN (0 < x < 0.96) alloy thin films are grown by reactive magnetron sputter deposition using a combination of high-power pulsed magnetron (HIPIMS) and dc magnetron sputtering (DCMS). Layers are deposited from elemental Ti and Al targets onto Si(001) substrates at 500 °C. All Ti1 xAlxN film surfaces are analyzed by x-ray photoelectron spectroscopy (XPS) employing monochromatic Al Ka radiation (hn = 1486.6 eV). Prior to spectra acquisition, TiAlN surfaces are sputter-cleaned in-situ with 4 keV Ar+ ions incident at an angle of 70° with respect to the surface normal. XPS results reveal satellite structures on the high binding energy side of the Ti2p, Ti3s, and Ti3p core-level signals. The intensities of the primary Ti features (Ti2p, Ti3s, and Ti3p) decrease with increasing AlN concentration such that the satellite peaks dominate spectra from films with x < 0.67. The density-of-states at the Fermi level also decrease with increasing x indicating that the satellite peaks are due to screening of core holes created by the photoionization event. Film compositions, obtained using XPS sensitivity factors, agree to within ±3% with values determined by time-of-flight elastic recoil detection analyses.
Place, publisher, year, edition, pages
2014. Vol. 21, 35-49 p.
Condensed Matter Physics
IdentifiersURN: urn:nbn:se:liu:diva-118603DOI: 10.1116/11.20140506OAI: oai:DiVA.org:liu-118603DiVA: diva2:815872