Comparison of the properties of Pb thin films deposited on Nb substrate using thermal evaporation and pulsed laser deposition techniques
2013 (English)In: Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, ISSN 0168-9002, Vol. 729, 451-455 p.Article in journal (Refereed) Published
Pb thin films were prepared at room temperature and in high vacuum by thermal evaporation and pulsed laser deposition techniques. Films deposited by both the techniques were investigated by scanning electron microscopy to determine their surface topology. The structure of the films was studied by X-ray diffraction in θ–2θ geometry. The photoelectron performances in terms of quantum efficiency were deduced by a high vacuum photodiode cell before and after laser cleaning procedures. Relatively high quantum efficiency (>10−5) was obtained for all the deposited films, comparable to that of corresponding bulk. Finally, film to substrate adhesion was also evaluated using the Daimler–Benz Rockwell-C adhesion test method. Weak and strong points of these two competitive techniques are illustrated and discussed.
Place, publisher, year, edition, pages
Elsevier , 2013. Vol. 729, 451-455 p.
Thin Films, Photocathodes, Pulsed laser deposition, Thermal evaporation, Quantum efficiency, Adhesion strength
Engineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-100905DOI: 10.1016/j.nima.2013.07.082ISI: 000325753500062OAI: oai:DiVA.org:liu-100905DiVA: diva2:664356
Funding Agencies|Istituto Nazionale di Fisica Nucleare (INFN)||Swedish Government Strategic Research Area Grant in Materials Science (SFO Mat-LiU)||2013-11-142013-11-142013-12-28