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Control of crystallinity in sputtered Cr–Ti–C films
Uppsala University, Sweden.
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.ORCID iD: 0000-0002-2837-3656
Uppsala University, Sweden.
2013 (English)In: Acta Materialia, ISSN 1359-6454, E-ISSN 1873-2453, Vol. 61, no 17, 6352-6361 p.Article in journal (Refereed) Published
Abstract [en]

The influence of Ti content on crystallinity and bonding of Cr–Ti–C thin films deposited by magnetron sputtering have been studied by X-ray diffraction, X-ray photoelectron spectroscopy, transmission electron microscopy and Raman spectroscopy. Our results show that binary Cr–C films without Ti exhibit an amorphous structure with two non-crystalline components; amorphous CrCx and amorphous C (a-C). The addition of 10–20 at.% Ti leads to the crystallization of the amorphous CrCx and the formation of a metastable cubic (Cr1−xTix)Cy phase. The observation was explained based on the tendency of the 3d transition metals to form crystalline carbide films. The mechanical properties of the films determined by nanoindentation and microindentation were found to be strongly dependent on the film composition in terms of hardness, elasticity modulus, hardness/elasticity ratio and crack development.

Place, publisher, year, edition, pages
Elsevier , 2013. Vol. 61, no 17, 6352-6361 p.
Keyword [en]
Carbides, Thin films, Crystallization, Amorphous alloy, Sputtering
National Category
Engineering and Technology
URN: urn:nbn:se:liu:diva-99400DOI: 10.1016/j.actamat.2013.06.045ISI: 000324791700003OAI: diva2:656922

Funding Agencies|Swedish Research Council (VR)||Swedish Foundation for Strategic Research (SSF) MS2E||

Available from: 2013-10-17 Created: 2013-10-17 Last updated: 2016-08-31

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