Control of crystallinity in sputtered Cr–Ti–C films
2013 (English)In: Acta Materialia, ISSN 1359-6454, E-ISSN 1873-2453, Vol. 61, no 17, 6352-6361 p.Article in journal (Refereed) Published
The influence of Ti content on crystallinity and bonding of Cr–Ti–C thin films deposited by magnetron sputtering have been studied by X-ray diffraction, X-ray photoelectron spectroscopy, transmission electron microscopy and Raman spectroscopy. Our results show that binary Cr–C films without Ti exhibit an amorphous structure with two non-crystalline components; amorphous CrCx and amorphous C (a-C). The addition of 10–20 at.% Ti leads to the crystallization of the amorphous CrCx and the formation of a metastable cubic (Cr1−xTix)Cy phase. The observation was explained based on the tendency of the 3d transition metals to form crystalline carbide films. The mechanical properties of the films determined by nanoindentation and microindentation were found to be strongly dependent on the film composition in terms of hardness, elasticity modulus, hardness/elasticity ratio and crack development.
Place, publisher, year, edition, pages
Elsevier , 2013. Vol. 61, no 17, 6352-6361 p.
Carbides, Thin films, Crystallization, Amorphous alloy, Sputtering
Engineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-99400DOI: 10.1016/j.actamat.2013.06.045ISI: 000324791700003OAI: oai:DiVA.org:liu-99400DiVA: diva2:656922
Funding Agencies|Swedish Research Council (VR)||Swedish Foundation for Strategic Research (SSF) MS2E||2013-10-172013-10-172016-08-31