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Implantation of anatase thin film with 100 keV Fe-56 ions: Damage formation and magnetic behaviour
Mälardalen University, Department of Biology and Chemical Engineering.
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2009 (English)In: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, ISSN 0168-583X, E-ISSN 1872-9584, Vol. 267, no 16, p. 2725-2730Article in journal (Refereed) Published
Abstract [en]

We have investigated the damage morphology and magnetic properties of titanium dioxide thin films following implantation with Fe ions. The titanium dioxide films, having a polycrystalline anatase structure, were implanted with 100 keV Fe-56(+) ions to a total fluence of 1.3 x 10(16) ions/cm(2). The ion bombardment leads to an amorphized surface with no indication of the presence of secondary phases or Fe clusters. The ion-beam induced damage manifested itself by a marked change in surface morphology and film thickness. A room temperature ferromagnetic behaviour was observed by SQUID in the implanted sample. It is believed that the ion-beam induced damage and defects in the polycrystalline anatase film were partly responsible for the observed magnetic response. 

Place, publisher, year, edition, pages
2009. Vol. 267, no 16, p. 2725-2730
National Category
Natural Sciences
Identifiers
URN: urn:nbn:se:mdh:diva-19870DOI: 10.1016/j.nimb.2009.05.055ISI: 000272422400039Scopus ID: 2-s2.0-68549140078OAI: oai:DiVA.org:mdh-19870DiVA, id: diva2:635746
Conference
23rd International Conference on Atomic Collisions in Solids, AUG 17-22, 2008, Phalaborwa, SOUTH AFRICA
Available from: 2013-07-05 Created: 2013-06-26 Last updated: 2017-12-06Bibliographically approved

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