Deposition of Thin Film Electrolyte by Pulsed Laser Deposition (PLD) for micro-SOFC Development
Optimalization of PLD deposition of YSZ for micr-SOFC electrolyte applications by varying deposition pressure and target-substrate distance.
Substrate used was Si-based chips and wafers (large area PLD), and the substrate temperature was held at 600.
Dense films were obtained at 20 mTorr.
Place, publisher, year, edition, pages
Institutt for materialteknologi , 2012. , 52 p.
ntnudaim:8218, MTMT Materialteknologi, Materialer og energiteknologi
IdentifiersURN: urn:nbn:no:ntnu:diva-19017Local ID: ntnudaim:8218OAI: oai:DiVA.org:ntnu-19017DiVA: diva2:566402
Dahl, Paul Inge, Forsker