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HIGH-RESOLUTION MICROPATTERNING OF OFF-STOCHIOMETRIC THIOL-ENES (OSTE) VIA A NOVEL LITHOGRAPHY MECHANISM
KTH, School of Electrical Engineering (EES), Microsystem Technology (Changed name 20121201). (Microsystem Technology Lab)
KTH, School of Electrical Engineering (EES), Microsystem Technology (Changed name 20121201). (Microsystem Technology Lab)
KTH, School of Electrical Engineering (EES), Microsystem Technology (Changed name 20121201). (Microsystem Technology Lab)
KTH, School of Electrical Engineering (EES), Microsystem Technology (Changed name 20121201). (Microsystem Technology Lab)ORCID iD: 0000-0002-9820-8728
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2012 (English)In: 16th International Conference on Miniaturized Systems for Chemistry and Life Sciences (microTAS 2012), 2012, 225-227 p.Conference paper, Oral presentation only (Refereed)
Abstract [en]

We present an entirely novel, self-limiting photolithography mechanism in off-stoichiometry thiol-ene (OSTE) polymers enabling high-resolution and high-aspect ratio features. The OSTE polymers have previously been shown to be promising materials for fabrication of microfluidic devices with tailored surface modifications and mechanical properties. We here introduce direct lithography for micropatterning of OSTE as an alternative to mechanical machining or casting, resulting in a simple and reliable fabrication method of self-bonding photopatterned multilayer microfluidic devices

Place, publisher, year, edition, pages
2012. 225-227 p.
Keyword [en]
lithography, off-stoichiometry thiol-ene, OSTE, micropatterning, microfluidics, microfabrication
National Category
Nano Technology
Identifiers
URN: urn:nbn:se:kth:diva-104072ISBN: 978-0-9798064-5-2 (print)OAI: oai:DiVA.org:kth-104072DiVA: diva2:562944
Conference
16th International Conference on Miniaturized Systems for Chemistry and Life Sciences (microTAS 2012), Okinawa, Japan, 28 Octo-1 Nov, 2012
Note

QC 20130110

Available from: 2012-10-26 Created: 2012-10-26 Last updated: 2015-06-18Bibliographically approved

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fulltext(728 kB)82 downloads
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File name FULLTEXT01.pdfFile size 728 kBChecksum SHA-512
8aebaaff95998d96255d49981d22b7f8998c1d4088edc09d65113a85ed731b8fcb167018285139890a0cbff34f0363a3d9a45d956e6c553f186a3f3e8ce1fe50
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http://www.mercenelabs.com/wp-content/uploads/2012/11/OSTE-high-aspect-ratio-lithography.pdfConference website

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Karlsson, J. MikaelCarlborg, FredrikSaharil, FarizahForsberg, FredrikNiklaus, Frankvan der Wijngaart, WouterHaraldsson, Tommy
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