Change search
ReferencesLink to record
Permanent link

Direct link
An introduction to thin film processing using high-power impulse magnetron sputtering
Linköping University, Department of Physics, Chemistry and Biology, Plasma and Coating Physics. Linköping University, The Institute of Technology.
Linköping University, Department of Physics, Chemistry and Biology, Plasma and Coating Physics. Linköping University, The Institute of Technology.ORCID iD: 0000-0003-2864-9509
2012 (English)In: Journal of Materials Research, ISSN 0884-2914, Vol. 27, no 5, 780-792 p.Article, review/survey (Refereed) Published
Abstract [en]

High-power impulse magnetron sputtering (HiPIMS) is a promising sputtering-based ionized physical vapor deposition technique and is already making its way to industrial applications. The major difference between HiPIMS and conventional magnetron sputtering processes is the mode of operation. In HiPIMS the power is applied to the magnetron (target) in unipolar pulses at a low duty factor (andlt;10%) and low frequency (andlt;10 kHz) leading to peak target power densities of the order of several kilowatts per square centimeter while keeping the average target power density low enough to avoid magnetron overheating and target melting. These conditions result in the generation of a highly dense plasma discharge, where a large fraction of the sputtered material is ionized and thereby providing new and added means for the synthesis of tailor-made thin films. In this review, the features distinguishing HiPIMS from other deposition methods will be addressed in detail along with how they influence the deposition conditions, such as the plasma parameters and the sputtered material, as well as the resulting thin film properties, such as microstructure, phase formation, and chemical composition. General trends will be established in conjunction to industrially relevant material systems to present this emerging technology to the interested reader.

Place, publisher, year, edition, pages
Cambridge University Press (CUP) / Materials Research Society , 2012. Vol. 27, no 5, 780-792 p.
National Category
Engineering and Technology
URN: urn:nbn:se:liu:diva-78284DOI: 10.1557/jmr.2012.8ISI: 000304064500004OAI: diva2:531813
Funding Agencies|Swedish Research Council (VR)|623-2009-7348|Available from: 2012-06-08 Created: 2012-06-08 Last updated: 2013-10-30

Open Access in DiVA

fulltext(773 kB)2947 downloads
File information
File name FULLTEXT01.pdfFile size 773 kBChecksum SHA-512
Type fulltextMimetype application/pdf

Other links

Publisher's full text

Search in DiVA

By author/editor
Lundin, DanielSarakinos, Kostas
By organisation
Plasma and Coating PhysicsThe Institute of Technology
In the same journal
Journal of Materials Research
Engineering and Technology

Search outside of DiVA

GoogleGoogle Scholar
Total: 2947 downloads
The number of downloads is the sum of all downloads of full texts. It may include eg previous versions that are now no longer available

Altmetric score

Total: 168 hits
ReferencesLink to record
Permanent link

Direct link