Selection of metal ion irradiation for controlling Ti1-xAlxN alloy growth via hybrid HIPIMS/magnetron co-sputtering
2012 (English)In: Vacuum, ISSN 0042-207X, E-ISSN 1879-2715, Vol. 86, no 8, 1036-1040 p.Article in journal (Refereed) Published
We demonstrate, for the first time, the growth of metastable single-phase NaCl-structure high-AlN-content Ti1-xAlxN alloys (x andlt;= 0.64) which simultaneously possess high hardness and low residual stress. The films are grown using a hybrid approach combining high-power pulsed magnetron (HPPMS/HIPIMS) and dc magnetron sputtering of opposing metal targets. With HIPIMS applied to the Al target, Aln+ ion irradiation (dominated by Aln+) of the growing film results in alloys 0.55 andlt;= x andlt;= 0.60 which exhibit hardness H similar to 30 GPa and low stress sigma = 0.2-0.7 GPa, tensile. In sharp contrast, films with corresponding AlN concentrations grown with HIPIMS applied to the Ti target, giving rise to Tin+ ion irradiation (with a significant Ti2+ component), are two-phase - cubic (Ti,Al)N and hexagonal AlN - with low hardness, H = 18-19 GPa, and high compressive stress ranging up to 2.7 GPa. Annealing alloys grown with HIPIMS applied to the Al target results in age hardening due to spinodal decomposition; the hardness of Ti0.41Al0.59N increases from 30 to 33 GPa following a 900 degrees C anneal.
Place, publisher, year, edition, pages
Elsevier , 2012. Vol. 86, no 8, 1036-1040 p.
HIPIMS, HPPMS, TiAlN, Ionized PVD
Engineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-77108DOI: 10.1016/j.vacuum.2011.10.027ISI: 000302444700003OAI: oai:DiVA.org:liu-77108DiVA: diva2:524890
Funding Agencies|European Research Council (ERC)||2012-05-042012-05-042016-08-31