Optimization of Active Vibration Control of a Laser Pattern Generator in Micro Lithography
2010 (English)In: Proceedings of the 10th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2010, euspen , 2010, Vol. 1, 491-494 p.Conference paper (Refereed)
The extreme precision requirements in semiconductor manufacturing drive the need for an active vibration isolation system in a laser pattern generator. Optimization has been performed and evaluated in a model using a high level programming tool . The areas of optimization were 1) Decoupling strategies for decentralized control and 2) Improved feed forward control. Only a limited description of the model itself is given here. More about the model is presented in  and .
Place, publisher, year, edition, pages
euspen , 2010. Vol. 1, 491-494 p.
Precision engineering, Semiconductor device manufacture, Semiconductor lasers, Active vibration controls, Active vibration isolation systems, High-level programming, Laser pattern generator, Semiconductor manufacturing
Other Mechanical Engineering
IdentifiersURN: urn:nbn:se:kth:diva-91386ScopusID: 2-s2.0-84911428079ISBN: 978-095530828-4OAI: oai:DiVA.org:kth-91386DiVA: diva2:509795
10th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2010, Delft, Netherlands, 31 May 2010 through 4 June 2010
QC 201203212012-03-212012-03-142015-04-22Bibliographically approved