Change search
ReferencesLink to record
Permanent link

Direct link
Measurement setup for High Power Impulse Magnetron Sputtering
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Signals and Systems Group.
2011 (English)Independent thesis Basic level (professional degree), 10 credits / 15 HE creditsStudent thesis
Abstract [en]

Recently material physics group at Science Institute of University of Iceland has been using reactive sputtering to grow thin films used in various research projects at the institute. These films have been grown using dc sputtering which has been proven a very successful method. High power impulse magnetron sputtering or HiPIMS is an new pulsed power sputtering method where shorter but high power pulses are used to sputter over lower steady power.

The project resulted in a functional system capable of growing thin films using HiPIMS. Thin films grown with high power pulses have a higher film density and other more preferable properties compared to films grown using direct current magnetron sputtering.

Place, publisher, year, edition, pages
2011. , 23 p.
Keyword [en]
measurement setup, magnetron sputtering
National Category
Computer Systems
URN: urn:nbn:se:uu:diva-162988ISRN: UTH-INGUTB-EX-E-2011/10-SEOAI: diva2:462278
Educational program
Bachelor Programme in Electrical Engineering
Available from: 2011-12-08 Created: 2011-12-06 Last updated: 2011-12-08Bibliographically approved

Open Access in DiVA

fulltext(8269 kB)648 downloads
File information
File name FULLTEXT01.pdfFile size 8269 kBChecksum SHA-512
Type fulltextMimetype application/pdf

By organisation
Signals and Systems Group
Computer Systems

Search outside of DiVA

GoogleGoogle Scholar
Total: 648 downloads
The number of downloads is the sum of all downloads of full texts. It may include eg previous versions that are now no longer available

Total: 246 hits
ReferencesLink to record
Permanent link

Direct link