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Measurement setup for High Power Impulse Magnetron Sputtering
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Signals and Systems Group.
2011 (English)Independent thesis Basic level (professional degree), 10 credits / 15 HE creditsStudent thesis
Abstract [en]

Recently material physics group at Science Institute of University of Iceland has been using reactive sputtering to grow thin films used in various research projects at the institute. These films have been grown using dc sputtering which has been proven a very successful method. High power impulse magnetron sputtering or HiPIMS is an new pulsed power sputtering method where shorter but high power pulses are used to sputter over lower steady power.

The project resulted in a functional system capable of growing thin films using HiPIMS. Thin films grown with high power pulses have a higher film density and other more preferable properties compared to films grown using direct current magnetron sputtering.

Place, publisher, year, edition, pages
2011. , 23 p.
Keyword [en]
measurement setup, magnetron sputtering
National Category
Computer Systems
Identifiers
URN: urn:nbn:se:uu:diva-162988ISRN: UTH-INGUTB-EX-E-2011/10-SEOAI: oai:DiVA.org:uu-162988DiVA: diva2:462278
Educational program
Bachelor Programme in Electrical Engineering
Uppsok
Technology
Supervisors
Examiners
Available from: 2011-12-08 Created: 2011-12-06 Last updated: 2011-12-08Bibliographically approved

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