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Manifold Enhancement of Electron Beam Induced Deposition Rate at Grazing Incidence
National Institute for Materials Science.ORCID iD: 0000-0003-2562-0540
National Institute for Materials Science.
National Institute for Materials Science.
2010 (English)In: Nanotechnology, ISSN 0957-4484, E-ISSN 1361-6528, Vol. 21, no 2, 025303- p.Article in journal (Refereed) Published
Abstract [en]

It is shown how a significant drawback of the electron beam induced deposition technique, namely its low deposition rate, can be circumvented. By tilting a sample, a larger part of the primary electron beam energy becomes dissipated closer to the interface. This in turn increases the emission of secondary electrons, largely responsible for the deposition of the adsorbed molecule components on the surface. An order of magnitude increase in the deposition rate is reported in the fabrication of metal nanowires from organic precursor gas.

Place, publisher, year, edition, pages
Institute of Physics Publishing (IOPP), 2010. Vol. 21, no 2, 025303- p.
Keyword [en]
EBID, lithography, deposition rate
National Category
Accelerator Physics and Instrumentation
Identifiers
URN: urn:nbn:se:kth:diva-48998DOI: 10.1088/0957-4484/21/2/025303ISI: 000272641800008OAI: oai:DiVA.org:kth-48998DiVA: diva2:459113
Note
QC 20111129Available from: 2012-01-27 Created: 2011-11-24 Last updated: 2017-12-08Bibliographically approved

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Sychugov, Ilya
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CiteExportLink to record
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