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Controlled interlayer between titanium carbon-nitride and aluminiumoxide
Uppsala University, Disciplinary Domain of Science and Technology, Chemistry, Department of Materials Chemistry.
2011 (English)Independent thesis Advanced level (professional degree), 20 credits / 30 HE creditsStudent thesis
Abstract [en]

In the industry of metal cutting tools the conditions are extreme; the temperature can vary thousand degrees rapidly and the pressure can be tremendously high. To survive this kind of stress the cutting tool must be both hard and tough. In order to obtain these properties different coatings are used on a base of cemented carbide, WC-Co. Common coatings are hard ceramics like titanium nitride and titanium carbon-nitride with an outer layer of aluminium oxide. In this thesis the possibility of using titanium dioxide as an interlayer between titanium carbon-nitride and aluminium oxide to control the morphology and phase of aluminium oxide is investigated. Of the different aluminium oxide phases only the alpha-Al2O3 is stable. The titanium carbon-nitride coatings are made by CVD (chemical vapour deposition); also the alumina is deposited by CVD. The titanium dioxide was deposited by atomic layer deposition (ALD) which is a sequential CVD technique that allows a lower deposition temperature and better control of the film growth than CVD. The obtained thin films were analyzed using XRD, Raman spectroscopy, ESCA and SEM. To test the adhesion of the coatings the samples were sand blasted. A thin interlayer of titanium dioxide causes the aluminium oxide to grow as alpha-Al2O3, thinner TiO2 gave better adhesion.

Place, publisher, year, edition, pages
2011. , 29 p.
UPTEC K, ISSN 1650-8297 ; 11006
Keyword [en]
Aluminium oxide, titanium oxide, titanium carbon-nitride, Chemical Vapour Deposition, Atomic Layer Deposition
National Category
Chemical Sciences
URN: urn:nbn:se:uu:diva-161088OAI: diva2:454308
Educational program
Master Programme in Chemical Engineering
Available from: 2011-11-15 Created: 2011-11-07 Last updated: 2011-11-15Bibliographically approved

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Munktell von Fieandt, Sara
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