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On the deposition rate in a high power pulsed magnetron sputtering discharge
University of Aachen, Germany.
Institute of Physics (IA), RWTH Aachen University, Germany.ORCID iD: 0000-0003-2864-9509
MELEC GmbH, Germany.
University of Aachen, Germany.
2006 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 89, no 15, 154104- p.Article in journal (Refereed) Published
Abstract [en]

The effect of the high pulse current and the duty cycle on the deposition rate in high power pulsed magnetron sputtering (HPPMS) is investigated. Using a Cr target and the same average target current, deposition rates are compared to dc magnetron sputtering (dcMS) rates. It is found that for a peak target current density I-Tpd of up to 570 mA cm(-2), HPPMS and dcMS deposition rates are equal. For I-Tpd greater than 570 mA cm(-2), optical emission spectroscopy shows a pronounced increase of the Cr+/Cr-0 signal ratio. In addition, a loss of deposition rate, which is attributed to self-sputtering, is observed.

Place, publisher, year, edition, pages
American Institute of Physics (AIP) , 2006. Vol. 89, no 15, 154104- p.
National Category
Engineering and Technology
URN: urn:nbn:se:liu:diva-71504DOI: 10.1063/1.2362575ISI: 000241247900142OAI: diva2:450290
Available from: 2011-10-20 Created: 2011-10-20 Last updated: 2014-10-29

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Sarakinos, Kostas
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