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Process modelling for reactive magnetron sputtering
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics. (Thin Films)
2011 (English)In: Potential and Applications of Thin Ceramic and Metal Coatings 2011. 2nd PATCMC, 6th - 8th June, 2011 Plzeň, Czech Republic / [ed] Pavel Baroch, Milan Kubasek, Plzen: University of West Bohemia , 2011, 25-28 p.Conference paper (Refereed)
Abstract [en]

Reactive magnetron sputtering is a widely used technique for deposition of various compound thin films such as oxides and nitrides. This contribution deals with process modelling for reactive sputtering. A brief discussion of the hysteresis effect and classical Berg’s model is presented, followed by examples of application. Finally, some current topics in reactive sputtering are presented.

Place, publisher, year, edition, pages
Plzen: University of West Bohemia , 2011. 25-28 p.
Keyword [en]
reactive sputtering, magnetron sputtering, thin films
National Category
Other Engineering and Technologies
Research subject
Engineering Science; Engineering Science with specialization in Electronics
URN: urn:nbn:se:uu:diva-154740ISBN: 978-80-261-0009-6OAI: diva2:432405
2nd PATCMC, 6th - 8th June, 2011 Plzeň, Czech Republic
Available from: 2011-08-04 Created: 2011-06-10 Last updated: 2012-01-25Bibliographically approved

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Kubart, Tomas
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