Growth of TiC/a-C:H nanocomposite films by reactive high power impulse magnetron sputtering under industrial conditions
2012 (English)In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 206, no 8-9, 2396-2402 p.Article in journal (Refereed) Published
Titanium carbide (TiC) films were deposited employing high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS) in an Ar-C2H2 atmosphere of various compositions. Analysis of the structural, bonding and compositional characteristics revealed that the deposited films are nanocomposites; either hydrogenated amorphous carbon and TiC (TiC/a-C:H), or Titanium and TiC (Ti/TiC) depending on the C/Ti ratio of the films. It was found that TiC/a-C:H films grown by HiPIMS were dense, and within a certain C2H2 flow range (4-15 sccm) showed little changes in C/Ti ratio, which also saturated towards 1. The HiPIMS grown films also exhibited the tendency to form smaller fractions of amorphous C matrix, and incorporate smaller amounts of oxygen contaminants, as compared to films grown by DCMS. The TiC/a-C:H films exhibited resistivity and hardness values of 4-8×102 μΩcm and 20-27 GPa, respectively when deposited by HiPIMS. The corresponding values for films grown by DCMS at the same deposition rate as HiPIMS were >10×102 μΩcm and ~6-10 GPa respectively, likely due to abundant formation of free C and porosity, allowing oxygen contaminations.
Place, publisher, year, edition, pages
Elsevier, 2012. Vol. 206, no 8-9, 2396-2402 p.
IdentifiersURN: urn:nbn:se:liu:diva-67485DOI: 10.1016/j.surfcoat.2011.10.039ISI: 000300458500047OAI: oai:DiVA.org:liu-67485DiVA: diva2:410561
funding agencies|Swedish Research Council (VR)| 621-2005-3245 621-2008-3222 623-2009-7348 |2011-04-142011-04-142015-05-28Bibliographically approved