Structure and composition of sputter-deposited nickel-tungsten oxide films
2011 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 519, no 7, 2062-2066 p.Article in journal (Refereed) Published
Films of mixed nickel-tungsten oxide, denoted NixW1-x oxide, were prepared by reactive DC magnetron co-sputtering from metallic targets and were characterized by Rutherford backscattering spectrometry. X-ray photoelectron spectroscopy, X-ray diffractometry and Raman spectroscopy. A consistent picture of the structure and composition emerged, and at x<0.50 the films comprised a mixture of amorphous WO3 and nanosized NiWO4, at x = 0.50 the nanosized NiWO4 phase was dominating, and at x>0.50 the films contained nanosized NiO and NiWO4.
Place, publisher, year, edition, pages
2011. Vol. 519, no 7, 2062-2066 p.
Tungsten oxide, Nickel oxide, X-ray photoelectron spectroscopy, Rutherford backscattering, X-ray diffraction, Raman spectroscopy
Research subject Engineering Science with specialization in Solid State Physics
IdentifiersURN: urn:nbn:se:uu:diva-149563DOI: 10.1016/j.tsf.2010.10.033ISI: 000287543300002OAI: oai:DiVA.org:uu-149563DiVA: diva2:405270