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Structure and composition of sputter-deposited nickel-tungsten oxide films
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Physics.
Institute of Solid State Physics, University of Latvia, Riga, Latvia.
Institute of Solid State Physics, University of Latvia, Riga, Latvia.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Physics.
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2011 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 519, no 7, 2062-2066 p.Article in journal (Refereed) Published
Abstract [en]

Films of mixed nickel-tungsten oxide, denoted NixW1-x oxide, were prepared by reactive DC magnetron co-sputtering from metallic targets and were characterized by Rutherford backscattering spectrometry. X-ray photoelectron spectroscopy, X-ray diffractometry and Raman spectroscopy. A consistent picture of the structure and composition emerged, and at x<0.50 the films comprised a mixture of amorphous WO3 and nanosized NiWO4, at x = 0.50 the nanosized NiWO4 phase was dominating, and at x>0.50 the films contained nanosized NiO and NiWO4.

Place, publisher, year, edition, pages
2011. Vol. 519, no 7, 2062-2066 p.
Keyword [en]
Tungsten oxide, Nickel oxide, X-ray photoelectron spectroscopy, Rutherford backscattering, X-ray diffraction, Raman spectroscopy
National Category
Materials Engineering
Research subject
Engineering Science with specialization in Solid State Physics
Identifiers
URN: urn:nbn:se:uu:diva-149563DOI: 10.1016/j.tsf.2010.10.033ISI: 000287543300002OAI: oai:DiVA.org:uu-149563DiVA: diva2:405270
Available from: 2011-09-23 Created: 2011-03-21 Last updated: 2017-12-11Bibliographically approved

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