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High density of genuine growth twins in electrodeposited aluminum
CEST, Viktor Kaplan Str 2, A-2700 Wiener Neustadt, Austria.
Austrian Acad Sci, Erich Schmid Inst Mat Sci, Jahnstr 12, A-8700 Leoben, Austria.
Univ Vienna, Phys Nanostruct Mat, Boltzmanngasse 5, A-1090 Vienna, Austria.
Univ Vienna, Phys Nanostruct Mat, Boltzmanngasse 5, A-1090 Vienna, Austria.
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2019 (English)In: Science Advances, E-ISSN 2375-2548, Vol. 5, no 10, article id eaax3894Article in journal (Refereed) Published
Abstract [en]

We demonstrate electrodeposition as a synthesis method for fabrication of Al coatings, up to 10 μm thick, containing a high density of genuine growth twins. This has not been expected since the twin boundary energy of pure Al is very high. TEM methods were used to analyze deposited Al and its nanoscaled twins. DFT methods confirmed that the influence of the substrate is limited to the layers close to the interface. Our findings are different from those achieved by sputtering of Al coatings restricted to a thickness less than 100 nm with twins dominated by epitaxial effects. We propose that in the case of electrodeposition, a high density of twins arises because of fast nucleation and is additionally promoted by a monolayer of adsorbed hydrogen originating from water impurities. Therefore, electrodeposition is a viable approach for tailoring the structure and properties of thicker, deposited Al coatings reinforced by twins.

Place, publisher, year, edition, pages
2019. Vol. 5, no 10, article id eaax3894
National Category
Materials Chemistry
Identifiers
URN: urn:nbn:se:uu:diva-396733DOI: 10.1126/sciadv.aax3894ISI: 000491132700071PubMedID: 31667344OAI: oai:DiVA.org:uu-396733DiVA, id: diva2:1373614
Funder
Swedish Research Council, 2014-5993Carl Tryggers foundation Swedish National Infrastructure for Computing (SNIC)Available from: 2019-11-27 Created: 2019-11-27 Last updated: 2019-11-27Bibliographically approved

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