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Atomic layer deposition of amorphous tin-gallium oxide films
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.ORCID iD: 0000-0002-3162-4292
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.ORCID iD: 0000-0002-3461-6036
Uppsala University, Disciplinary Domain of Science and Technology, Physics, Department of Physics and Astronomy, Applied Nuclear Physics.ORCID iD: 0000-0002-5815-3742
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
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2019 (English)In: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, ISSN 0734-2101, E-ISSN 1520-8559, Vol. 37, no 3, article id 030906Article in journal (Refereed) Published
Abstract [en]

A wide range of applications benefit from transparent semiconducting oxides with tunable electronic properties, for example, electron transport layers in solar cell devices, where the electron affinity is a key parameter. Presently, a few different ternary oxides are used for this purpose, but the attainable electron affinity range is typically limited. In this study, the authors develop a low-temperature atomic layer deposition (ALD) process to grow amorphous Sn1-xGaxOy thin films from dimethylamino-metal complexes and water. This oxide is predicted to provide a wide selection of possible electron affinity values, from around 3 eV for pure Ga2O3 to 4.5 eV for pure SnO2. The ALD process is evaluated for deposition temperatures in the range of 105-195 degrees C by in situ quartz crystal microbalance and with ex situ film characterization. The growth exhibits an ideal-like behavior at 175 degrees C, where the film composition can be predicted by a simple rule of mixture. Depending on film composition, the growth per cycle varies in the range of 0.6-0.8 angstrom at this temperature. Furthermore, the film composition for a given process appears insensitive to the deposition temperature. From material characterization, it is shown that the deposited films are highly resistive, fully amorphous, and homogeneous, with moderate levels of impurities (carbon, nitrogen, and hydrogen). By tailoring the metal cation ratio in films grown at 175 degrees C, the optical bandgap can be varied in the range from 2.7 eV for SnO2 to above 4.2 eV for Ga2O3. The bandgap also varies significantly as a function of deposition temperature. This control of properties indicates that Sn1-xGaxOy is a promising candidate for an electron transport layer material in a wide electron affinity range. Published by the AVS.

Place, publisher, year, edition, pages
A V S AMER INST PHYSICS , 2019. Vol. 37, no 3, article id 030906
National Category
Condensed Matter Physics Materials Chemistry Engineering and Technology
Identifiers
URN: urn:nbn:se:uu:diva-390540DOI: 10.1116/1.5092877ISI: 000472182400033OAI: oai:DiVA.org:uu-390540DiVA, id: diva2:1341974
Funder
Swedish Energy Agency, 2017-004796Swedish Research Council, 2017-00646 9Swedish Foundation for Strategic Research , RIF14-0053Available from: 2019-08-12 Created: 2019-08-12 Last updated: 2020-08-03Bibliographically approved
In thesis
1. Window Layer Structures for Chalcopyrite Thin-Film Solar Cells
Open this publication in new window or tab >>Window Layer Structures for Chalcopyrite Thin-Film Solar Cells
2020 (English)Doctoral thesis, comprehensive summary (Other academic)
Abstract [en]

This thesis aims to contribute to the development of improved window layer structures for chalcopyrite thin-film solar cells, with an emphasis on the buffer layer, to assist future reductions of the levelized cost of energy. This is realized by exploring the potential of existing materials and deposition processes, as well as developing new buffer layer processes based on atomic layer deposition (ALD).

Ternary compound ALD processes are more complicated to control than when depositing binary compounds and the composition can be significantly different at the absorber interface as compared to the bulk. A method based on in-situ quartz crystal microbalance that can measure these compositional variations is demonstrated in the thesis. Furthermore, the addition of alkali-metal fluoride post-deposition treatments (PDTs) can further complicate ALD of buffer layers, due to residual salts that are formed on the absorber surface during a PDT process. When applying ALD ZnO1-xSx to KF-treated CIGS absorbers, competitive solar cell efficiencies could only be obtained after performing additional wet-chemical treatments prior to ALD processing.

It is shown that the performance of wide-bandgap solar cells can be greatly enhanced by improving the conduction band alignment between the absorber and buffer layers. By applying ALD Zn1-xSnxOy buffer layers in CuGaSe2 solar cells, record efficiency (η = 11.9%) and open-circuit voltage (Voc = 1017 mV) values are demonstrated.

In search of a new buffer layer suitable for a wide range of absorber materials (and surface bandgaps), amorphous tin-gallium oxide grown by ALD is evaluated as a new buffer layer material. This material exhibits a highly variable bandgap (and electron affinity) the absorber/buffer conduction band alignment can be controlled by adjusting the cation composition and deposition temperature. The potential of Sn1-xGaxOy as a buffer layer was studied in combination with low-bandgap (Ag,Cu)(In,Ga)Se2 absorbers (Eg,surface ≈ 1.1 eV). A best cell efficiency of 17.0% was achieved, which was lower than the efficiency of 18.6% obtained for the corresponding CdS reference due to slightly lower Voc and higher series resistance. However, the full potential of Sn1-xGaxOy as a buffer layer remains to be revealed.

Place, publisher, year, edition, pages
Uppsala: Acta Universitatis Upsaliensis, 2020. p. 110
Series
Digital Comprehensive Summaries of Uppsala Dissertations from the Faculty of Science and Technology, ISSN 1651-6214 ; 1951
Keywords
CIGS, atomic layer deposition, ALD, thin-film technology, window layer structures, buffer layers, front contacts, metal oxides, ternary compounds, CIGS, tunnfilmssolceller, ALD, tunnfilmsteknik, fönsterlager, buffertlager, framkontakter, metalloxider, ternära föreningar
National Category
Engineering and Technology Other Materials Engineering Other Electrical Engineering, Electronic Engineering, Information Engineering
Research subject
Engineering Science with specialization in Electronics
Identifiers
urn:nbn:se:uu:diva-416751 (URN)978-91-513-0984-2 (ISBN)
Public defence
2020-09-18, Häggsalen, Ångströmlaboratoriet, Lägerhyddsvägen 1, Uppsala, 09:15 (English)
Opponent
Supervisors
Available from: 2020-08-27 Created: 2020-08-03 Last updated: 2020-09-02Bibliographically approved

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Larsson, FredrikKeller, JanPrimetzhofer, DanielRiekehr, LarsEdoff, MarikaTörndahl, Tobias
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