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Bipolar high power impulse magnetron sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias
Linköping University, Department of Physics, Chemistry and Biology, Plasma and Coating Physics. Linköping University, Faculty of Science & Engineering.
School of Mechanical Engineering and Automation, Beihang University, Beijing 100191, PR China.
Linköping University, Department of Physics, Chemistry and Biology, Plasma and Coating Physics. Linköping University, Faculty of Science & Engineering.ORCID iD: 0000-0002-6602-7981
Linköping University, Department of Physics, Chemistry and Biology, Plasma and Coating Physics. Linköping University, Faculty of Science & Engineering.
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2019 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 688, article id 137350Article in journal (Refereed) Published
Abstract [en]

The effect of applying a positive voltage pulse (Urev = 10–150 V) directly after the negative high power impulse magnetron sputtering (HiPIMS) pulse (bipolar HiPIMS) is investigated for the reactive sputter deposition of TiN thin films. Energy-resolved mass spectroscopy analyses are performed to gain insight in the effect on the ion energy distribution function of the various ions. It is demonstrated that the energy of a large fraction of the ions can be tuned by a reverse target potential and gain energy corresponding to the applied Urev. Microscopy observations and x-ray reflectometry reveal densification of the films which results in an increase in the film hardness from 23.9 to 34 GPa as well as an increase in compressive film stress from 2.1 GPa to 4.7 GPa when comparing conventional HiPIMS with bipolar HiPIMS (Urev = 150 V).

Place, publisher, year, edition, pages
Elsevier, 2019. Vol. 688, article id 137350
Keywords [en]
High power impulse magnetron sputtering, Bipolar HiPIMS, Ion energy distribution function tuning, Titanium nitride
National Category
Physical Sciences
Identifiers
URN: urn:nbn:se:liu:diva-158296DOI: 10.1016/j.tsf.2019.05.069ISI: 000485256500006Scopus ID: 2-s2.0-85067028388OAI: oai:DiVA.org:liu-158296DiVA, id: diva2:1332576
Available from: 2019-06-28 Created: 2019-06-28 Last updated: 2019-11-14Bibliographically approved

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Viloan, Rommel Paulo B.Boyd, RobertKeraudy, JulienHelmersson, Ulf
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