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Block Copolymer Lithographyfor Nano-porous Oxide Thin Films
KTH, School of Electrical Engineering and Computer Science (EECS).
2018 (English)Independent thesis Advanced level (degree of Master (Two Years)), 20 credits / 30 HE creditsStudent thesis
Abstract [en]

This thesis focuses on employing a new patterning technique called block copolymer lithography to transfer the nano-porous pattern from the polymer template to the underlying oxide thin film. Nano-porous block copolymer films are produced by spin-coating polymer solution on wafers followed by annealing, UV exposure and development processes. Reactive-ion etching is then used to etch the oxide films based on the pattern of polymer template and the polymer is then removed. The obtained oxide microstructure is characterized by SEM, showing a nanomesh of microdomains with the same hole size and density as the initial block copolymer layer. The advantages of block copolymer lithography include uniform nanopatterning, cost efficiency and simple processing. The nano-porous oxide thin films could be used as hard mask for nanopatterning in microelectronics and for energy storage applications.

Abstract [sv]

Denna avhandling fokuserar på användningen av en ny mönstringsteknik som kallas block-sampolymerlitografi som används för att överföra nano-porösa mönster från polymermaller till en underliggande oxidtunnfilm. Nano-porösa blocksampolymerfilmer framställs genom spinbeläggningspolymerlösning på skivor följt av glödgning, UV-exponering och utvecklingsprocesser. Reaktionjon etsning används sedan för att etsa oxidfilmerna baserat på mönstret av polymermaller och därefter blir polymeren avlägsnad. Den erhållna oxidmikrostrukturen karakteriseras av SEM, som visar en nanomesh av mikrodomäner med samma hålstorlek och densitet som det ursprungliga blocksampolymerskiktet. Fördelarna med block-sampolymerlitografi innefattar likformig nanomönstring, kostnadseffektivitet och enkel bearbetning. De nanoporösa oxidtunnfilmerna kan användas som en hard mask för nanomönstring i mikroelektronik och för energilagringsapplikationer.

Place, publisher, year, edition, pages
2018. , p. 63
Series
TRITA-EECS-EX ; 2018:352
Keywords [en]
Block Copolymer, Lithography, Nanopatterning, Reactive-Ion Etching, Oxide Thin Films
Keywords [sv]
Blockcopolymer, Litografi, Nanopakning, Reaktion-Jon Etsning, Oxidtunnfilmerna
National Category
Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:kth:diva-254331OAI: oai:DiVA.org:kth-254331DiVA, id: diva2:1330773
Subject / course
Electrical Engineering
Educational program
Degree of Master
Examiners
Available from: 2019-06-26 Created: 2019-06-26 Last updated: 2019-06-26Bibliographically approved

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CiteExportLink to record
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