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Compositional and morphological analysis of FeW films modified by sputtering and heating
KTH Royal Inst Technol, Sch Elect Engn, Dept Fus Plasma Phys, SE-10044 Stockholm, Sweden..ORCID iD: 0000-0001-9299-3262
Uppsala University, Disciplinary Domain of Science and Technology, Physics, Department of Physics and Astronomy, Applied Nuclear Physics.ORCID iD: 0000-0002-5815-3742
Max Planck Inst Plasma Phys, D-85748 Garching, Germany..
Max Planck Inst Plasma Phys, D-85748 Garching, Germany..
2017 (English)In: NUCLEAR MATERIALS AND ENERGY, ISSN 2352-1791, Vol. 12, p. 472-477Article in journal (Refereed) Published
Abstract [en]

Surface compositional changes of iron- tungsten films by deuterium (D) ion bombardment were studied by means of medium energy ion scattering, elastic recoil detection analysis and Rutherford backscattering spectrometry. The energy of the bombarding ions was 200 eV/D and the fluence was varied from 10(21) D/m(2) to 10 24 D/m(2). A significant increase of the tungsten concentration within the 20 nm closest to the sample surface, caused by preferential sputtering of iron, was seen for the films exposed 10(23) D/m(2) or more. In the sample exposed to the highest fluence, 10(24) D/m(2), the concentration of tungsten was increased from an initial 1.7 at. % up to approximately 24 at. % averaged over the 5 nm closest to the surface. The analysis was complicated by the presence of oxygen on the sample surfaces. In order to study the thermal stability of the tungsten enriched layer, the sample initially exposed to 10(23) D/m(2) at room temperature was heated to 400 degrees C in the measurement chamber for medium energy ion scattering and several spectra were recorded at intermediate temperatures. The obtained data showed that the layer was relatively stable below 200 degrees C whereas a drastic change in the film composition occurred between 200 degrees C and 250 degrees C due to interdiffusion of iron and silicon, the latter of which was the substrate material. The surface morphologies of the films were probed with atomic force microscopy showing that protrusions of 10-100 nm width appeared after deuterium bombardment at fluences higher than 10(22) D/m(2).

Place, publisher, year, edition, pages
2017. Vol. 12, p. 472-477
Keywords [en]
Eurofer, Model film, ToF-MEIS, Preferential sputtering, Surface enrichment
National Category
Composite Science and Engineering Subatomic Physics
Identifiers
URN: urn:nbn:se:uu:diva-344536DOI: 10.1016/j.nme.2017.03.002ISI: 000417293300073OAI: oai:DiVA.org:uu-344536DiVA, id: diva2:1188385
Funder
Swedish Foundation for Strategic Research Göran Gustafsson Foundation for promotion of scientific research at Uppala University and Royal Institute of TechnologyAvailable from: 2018-03-07 Created: 2018-03-07 Last updated: 2018-03-07Bibliographically approved

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