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Unprecedented thermal stability of inherently metastable titanium aluminum nitride by point defect engineering
Rhein Westfal TH Aachen, Mat Chem, D-52074 Aachen, Germany.;GTT Technol, Herzogenrath, Germany..
Rhein Westfal TH Aachen, Mat Chem, D-52074 Aachen, Germany..
Uppsala University, Disciplinary Domain of Science and Technology, Physics, Department of Physics and Astronomy, Applied Nuclear Physics.
Rhein Westfal TH Aachen, Mat Chem, D-52074 Aachen, Germany..
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2017 (English)In: MATERIALS RESEARCH LETTERS, ISSN 2166-3831, Vol. 5, no 3, 158-169 p.Article in journal (Refereed) Published
Abstract [en]

Extreme cooling rates during physical vapor deposition (PVD) allow growth of metastable phases. However, we propose that reactive PVD processes can be described by a gas-solid paraequilibrium defining chemical composition and thus point defect concentration. Weshow that this notion allows for point defect engineering by controlling deposition conditions. As example we demonstrate that thermal stability of metastable (Ti, Al) Nx, the industrial benchmark coating for wear protection, can be increased from 800 degrees C to unprecedented 1200 degrees C by minimizing the vacancy concentration. The thermodynamic approach formulated here opens a pathway for thermal stability engineering by point defects in reactively deposited thin films.

Place, publisher, year, edition, pages
TAYLOR & FRANCIS INC , 2017. Vol. 5, no 3, 158-169 p.
Keyword [en]
TiAlN, thin films, hard coatings, vacancies, thermodynamics
National Category
Materials Engineering
Identifiers
URN: urn:nbn:se:uu:diva-320931DOI: 10.1080/21663831.2016.1233914ISI: 000398627000003OAI: oai:DiVA.org:uu-320931DiVA: diva2:1091596
Funder
German Research Foundation (DFG), 2016-04-18T13:01:18.000000 2011-09-10T10:48:02.000000 SFB-TR 8
Available from: 2017-04-27 Created: 2017-04-27 Last updated: 2017-04-27Bibliographically approved

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