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Scalable Manufacturing of Single Nanowire Devices Using Crack-Defined Shadow Mask Lithography
KTH, School of Electrical Engineering and Computer Science (EECS), Micro and Nanosystems.ORCID iD: 0000-0002-8821-6759
KTH, School of Electrical Engineering and Computer Science (EECS), Micro and Nanosystems.ORCID iD: 0000-0001-6731-3886
KTH, School of Electrical Engineering and Computer Science (EECS), Micro and Nanosystems.ORCID iD: 0000-0002-0525-8647
KTH, School of Electrical Engineering and Computer Science (EECS), Micro and Nanosystems.ORCID iD: 0000-0001-9552-4234
2019 (English)In: ACS Applied Materials and Interfaces, ISSN 1944-8244, E-ISSN 1944-8252, Vol. 11, no 8, p. 8217-8226Article in journal (Refereed) Published
Abstract [en]

Single nanowires (NWs) have a broad range of applications in nanoelectronics, nanomechanics, and nano photonics, but, to date, no technique can produce single sub 20 nm wide NWs with electrical connections in a scalable fashion. In this work, we combine conventional optical and crack lithographies to generate single NW devices with controllable and predictable dimensions and placement and with individual electrical contacts to the NWs. We demonstrate NWs made of gold, platinum, palladium, tungsten, tin, and metal oxides. We have used conventional i-line stepper lithography with a nominal resolution of 365 nm to define crack lithography structures in a shadow mask for large-scale manufacturing of sub-20 nm wide NWs, which is a 20-fold improvement over the resolution that is possible with the utilized stepper lithography. Overall, the proposed method represents an effective approach to generate single NW devices with useful applications in electrochemistry, photonics, and gas- and biosensing.

Place, publisher, year, edition, pages
2019. Vol. 11, no 8, p. 8217-8226
National Category
Nano Technology
Identifiers
URN: urn:nbn:se:kth:diva-250298DOI: 10.1021/acsami.8b19410ISI: 000460365300061PubMedID: 30698940Scopus ID: 2-s2.0-85061896644OAI: oai:DiVA.org:kth-250298DiVA, id: diva2:1307732
Note

QC 20190430

Available from: 2019-04-29 Created: 2019-04-29 Last updated: 2020-03-09Bibliographically approved

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Enrico, AlessandroDubois, Valentin J.Niklaus, FrankStemme, Göran
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